Intel Corp.’s newly formed chip foundry business said today it has achieved a crucial milestone for the chipmaking industry by completing the assembly of the world’s first commercial High Numerical ...

SK hynix and ASML early on Wednesday announced that they had assembled the industry's first Twinscan NXE:5200B High-NA EUV lithography system at the company's fab M16 in Icheon, South Korea. The ...

US startup aims to develop free-electron lasers directly emitting EUV light, in place of today’s laser-driven plasma systems. xLight, a US startup aiming to commercialize particle accelerator driven ...

ASML Holding (ASML) is aiming for about 30% year-over-year growth in extreme ultraviolet (EUV) revenues in 2025. ASML expects this growth to be driven by both an increase in Low Numerical Aperture (NA ...

What just happened? SK hynix and ASML have installed the world's first Twinscan NXE:5200B High-NA EUV lithography system at SK hynix's M16 fabrication plant in Icheon, South Korea. The new equipment ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a leading manufacturer of light sources used in lithography, has announced that in the field of Laser-Produced Plasma (LPP) light sources for EUV ...

Intel has successfully completed acceptance testing on the first second-generation High Numerical Aperture (High-NA) extreme ultraviolet (EUV) lithography system, marking a significant step in its ...

China is said to have completed the first fundamentally functioning prototype of an EUV lithography system in early 2025. EUV stands for extreme ultraviolet light, which enables the finest transistor ...