First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” ...
Fast LFD Flows With Pattern Matching And Machine Learning Can Deliver Higher-Yielding Designs Faster
A lithographic (litho) hotspot is a defect on a wafer that is created during manufacturing by a combination of systematic process variation and resolution enhancement technology (RET) limitations.
Researchers have developed a new method that allows users to redesign process workflows by simply chatting with an AI. Dubbed "Conversational Process Model Redesign" (CPD), the technique combines ...
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